Dynamic Simulation of a Multichamber CVD Cluster Tool

Dynamic, physically based simulation has proved very effective in representing the timedependent behavior of equipment, process, sensor and control systems. We have developed a system-level dynamic simulator for an 8” CVD cluster tool (ULVAC-ERA1000). The simulator incorporates models for equipment, process and control systems, representing time-dependent system level behavior through the imposition of equipment controller recipes for pump-down, process and venting cycles. Multistage pumping systems (Roots-mechanical and turbomechanical) are modeled using compression ratios, nominal speeds, and volumes to reflect actual behavior, validated against experiments on the Ulvac tool. The process simulator is derived from the work of Hsieh et al. The Ulvac simulator is applied to optimization of deposition rate and WF6 utilization, analysis of experimental data for recipe improvement, and development and debugging of equipment controller software and operation. a) Current address: Intel Corporation, Hillsboro, OR